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Oxide layers for applications in dentistry and implantology

Description: Our technology enables conformal deposition of amorphous ZrO2, HfO2 layers, well adhering to the substrate and tightly separating the implant material from the biological environment.

We tested the oxides of transition metals for their anti-bacterial activity and biocompatibility with osteo-cells. Based on these investigations we have selected zirconium dioxide, hafnium dioxide and titanium dioxide, obtained by Atomic layer Deposition (ALD) technology, as the most promising coating materials. Our technology enables conformal deposition of amorphous ZrO2, HfO2 layers, well adhering to the substrate and tightly separating the implant material from the biological environment. We studied the development of bone marrow stromal cells in contact with the ALD layers and observed different behavior of such cells in relation to different oxides. Since ZrO2 is already used in dentistry, Ti tooth implant coating with ZrO2 is the most likely the first application of our technology. The most promising results we obtained for HfO2 coating – patent application (Polish patent application No: 433753).

Organisation: Institute of Physics Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

Innovator(s): Aleksandra Seweryn, Bartłomiej S. Witkowski, Marek Godlewski

Category: Medicine, Biotechnology and Medical Devices

Country: Poland

Gold Award